ASML, the company known for producing equipment for the manufacture of processors and semiconductors at foundries, has started to ship its new Twinscan NXT:2000i DUV (Deep Ultra Violet) scanner that matches overlay performance of the company’s Twinscan NXE:3400B EUV (Extreme Ultra Violet) scanner. The new machine will be used to make chips using 5 nm and 7 nm nodes and will be required by makers of semiconductors who will have tighter overlay requirements and will have to mix-and-match overlay capabilities between different types of step-and-scan systems. When leading manufacturers of chips start to use Twinscan NXE EUV lithography scanners for their 7 nm and more advanced process technologies in the coming quarters/years for some of the metal layers for the processors, DUV equipment is still...
In our recent trip to GlobalFoundries Fab 8, its leading edge facility, we managed to spend some time with the C-level executive that controls the future of this part...38 by Ian Cutress on 2/24/2018
Samsung this week announced that its 8LPP fabrication process, which it formally introduced earlier this year, had passed qualification tests. The manufacturing technology will be used to produce advanced...35 by Anton Shilov on 10/19/2017
Keeping an eye on the ever-evolving world of silicon lithography, GlobalFoundries has recently disclosed additional details about its 7 nm generation of process technologies. As announced last September, the...75 by Anton Shilov on 6/23/2017
Samsung and TSMC have made several important announcements about the present and future of their semiconductor manufacturing technologies in March. Samsung revealed that it had shipped over 70 thousand...89 by Anton Shilov on 5/5/2017