ASML
Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. But the vast majority of chips that we are going to use in the next couple of years will be made using Low-NA EUV litho tools. This is why the latest announcement from ASML is particularly notable. As spotted by Computerbase, ASML this week has delivered its first updated Twinscan NXE:3800E lithography machine for fab installation. The latest iteration of the company's line of 0.33 numerical aperture (Low-NA) lithography scanners, the NXE:3800E is aimed at making chips on 2nm and 3nm-class technologies. Chipmakers have a need for speed! The first TWINSCAN NXE:3800E...
ASML to Ship Multiple High-NA Tools in 2025, Expands Production Capacities
ASML began to ship its first High-NA lithography tool to Intel late last year ,and the machine will be fully assembled in Oregon in the coming months. Shipping only...
8 by Anton Shilov on 2/14/2024
ASML's First High-NA EUV Litho Scanner Arrives At Intel [UPDATED]
Update 1/5/2024: Intel Oregon announced on Thursday that it has received its shipment of ASML's first-generation Twinscan EXE:5000 High-NA EUV lithography scanner. The two companies will start assembly process...
28 by Anton Shilov on 1/5/2024
ASML to Deliver First High-NA EUV Tool This Year
In a promising sign for the development of the next generation of EUV lithography machines, ASML has revealed that the company is set to deliver the industry's first High-NA...
7 by Anton Shilov on 9/6/2023
NVIDIA's cuLitho to Speed Up Computational Lithography for 2nm and Beyond
Production of chips using leading-edge process technologies requires more compute power than ever. To address requirements of 2nm nodes and beyond, NVIDIA is rolling out its cuLitho software library...
31 by Anton Shilov on 3/27/2023
TSMC and ASML: Demand for Chips Remains Strong, But Getting Fab Tools Is Hard
TSMC's revenue this year is going to set an all-time record for the company, thanks to high demand for chips as well as increased prices that its customers are...
13 by Anton Shilov on 7/21/2022
ASML High-NA Development Update: Coming to Fabs in 2024 - 2025
It took the semiconductor industry over a decade to prep everything needed for production of chips using extreme ultraviolet (EUV) lithography. It looks like it is going to take...
8 by Anton Shilov on 5/26/2022
An AnandTech Interview with TSMC: Dr. Kevin Zhang and Dr. Maria Marced
In the past week, TSMC ran its 2021 Technology Symposium, covering its latest developments in process node technology designed to improve the performance, costs, and capabilities for its customers...
18 by Dr. Ian Cutress on 6/8/2021
EUV Pellicles Ready For Fabs, Expected to Boost Chip Yields and Sizes
Foundries started limited usage of extreme ultraviolet (EUV) lithography for high-volume manufacturing (HVM) of chips in 2019. At the time, ASML's Twinscan NXE scanners were good enough for production...
35 by Anton Shilov on 3/31/2021
TSMC: We have 50% of All EUV Installations, 60% Wafer Capacity
One of the overriding central messages to TSMC’s Technology Symposium this week is that the company is a world leader in semiconductor manufacturing, especially at the leading edge process...
32 by Dr. Ian Cutress on 8/27/2020
ASML’s First Multi-Beam Inspection Tool for 5nm
ASML has announced it has made a significant development in its multi-beam inspectional tool line. The new eScan1000 moves a single beam scanning process into a nine-beam scanning process...
19 by Dr. Ian Cutress on 6/1/2020
ASML Ramps Up EUV Scanners Production: 35 in 2020, Up to 50 in 2021
ASML shipped 26 extreme ultraviolet lithography (EUVL) step-and-scan systems to its customers last year, and the company plans to increase shipments to around 35 in 2020. And the ramp-up...
22 by Anton Shilov on 1/23/2020
EUV Wafers Processed and TwinScan Machine Uptime: A Quick Look
One of the interesting elements that came out of some of our discussions at the IEDM conference this year revolve around the present deployment of EUV. Currently only one...
29 by Dr. Ian Cutress on 12/11/2019
EUV Demand is Up: EUV Device Manufacturer ASML Beats Sales Estimates
Between the smartphone revolution, cloud computing, and the Internet of Things, the demand for cutting-edge chips has never been higher. And if you have any doubts about that, then...
46 by Anton Shilov on 10/16/2019
ASML to Ship 30 EUV Scanners in 2019: Faster EUV Tools Coming
ASML said last week that it planned to ship 30 extreme ultraviolet scanners in 2019, up significantly from 2018. The plan is not surprising, as demand for EUV lithography...
17 by Anton Shilov on 1/28/2019
ASML, Carl Zeiss, and Nikon to Settle Legal Disputes Over Immersion Lithography
Embroiled for some time now in legal disputes concerning immersion lithography, ASML, Carl Zeiss, and Nikon, this week signed a memorandum of understanding relating to a plan to once...
10 by Anton Shilov on 1/25/2019
ASML Ships Twinscan NXT:2000i Scanner for 7nm and 5nm DUV
ASML, the company known for producing equipment for the manufacture of processors and semiconductors at foundries, has started to ship its new Twinscan NXT:2000i DUV (Deep Ultra Violet) scanner...
15 by Anton Shilov on 8/2/2018
The Future of Silicon: An Exclusive Interview with Dr. Gary Patton, CTO of GlobalFoundries
In our recent trip to GlobalFoundries Fab 8, its leading edge facility, we managed to spend some time with the C-level executive that controls the future of this part...
39 by Ian Cutress on 2/24/2018
The AnandTech Podcast, Episode 45: GlobalFoundries and Fab 8
In early February, GlobalFoundries did something completely unexpected: for the second time in ten years, they invited a few select press and analysts to visit one of their fabrication...
14 by Ian Cutress on 2/20/2018
EUV Lithography Makes Good Progress, Still Not Ready for Prime Time
At the recent annual SPIE Advanced Lithography conference, Intel, TSMC and other leading semiconductor companies said that significant strides have been made in extreme ultraviolet lithography (EUVL) over the...
38 by Anton Shilov on 3/10/2016
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