ASML, the company known for producing equipment for the manufacture of processors and semiconductors at foundries, has started to ship its new Twinscan NXT:2000i DUV (Deep Ultra Violet) scanner that matches overlay performance of the company’s Twinscan NXE:3400B EUV (Extreme Ultra Violet) scanner. The new machine will be used to make chips using 5 nm and 7 nm nodes and will be required by makers of semiconductors who will have tighter overlay requirements and will have to mix-and-match overlay capabilities between different types of step-and-scan systems. When leading manufacturers of chips start to use Twinscan NXE EUV lithography scanners for their 7 nm and more advanced process technologies in the coming quarters/years for some of the metal layers for the processors, DUV equipment is still...
In our recent trip to GlobalFoundries Fab 8, its leading edge facility, we managed to spend some time with the C-level executive that controls the future of this part...39 by Ian Cutress on 2/24/2018
In early February, GlobalFoundries did something completely unexpected: for the second time in ten years, they invited a few select press and analysts to visit one of their fabrication...12 by Ian Cutress on 2/20/2018
At the recent annual SPIE Advanced Lithography conference, Intel, TSMC and other leading semiconductor companies said that significant strides have been made in extreme ultraviolet lithography (EUVL) over the...37 by Anton Shilov on 3/10/2016